1500 Series Research DC Power Supplies & Sputtering Packages

 

 

Ion™ 1500 DC Magnetron Power Supply

Ion™ 1500 Series Research DC Power Supplies Sales Brochure PS 700 04/11 Rev. D

Features

  •  Superior Arc Detection & Suppression -  < 100 nsecs (.1 µ secs)
  •  Adjustable Arc Detection Delay & Off Time Before Restarting
  •  Voltage, Current & Power Regulation Modes
  •  Adjustable Power Ramping
  •  Adjustable Run Timer
  •  Stored Target Parameters for Up to 7 Separate Targets
  •  kWHr Counting & Time Limit
  •  RS-232 & Analog Communication Capability
  •  Wide 0-1000 Volt Range Compared to 0-800 volts Supplied by Competitors - Full Rated Power can be Applied Under Nearly all Conditions
  •  Stable operation down to 20 watts for non-reactive processes
  •  Suitable for use as a substrate bias power supply
  •  No Transformer Tap Changes Are Necessary to Operate Across Entire Range
  •  Compact, low profile chassis -Saves rack space
  •  2 Year Warranty

Complete Sputtering Packages

Polaris GEN II 2" & 3" Research Sputtering Sources
used in combination with the Ion™ 1500 allow performance
not possible with any other sputtering source & DC power
supply - for example:

  •  Sputter 1/4" [6,35 mm] thick Ni targets
  •  Deposit insulating films from metallic targets without the use of expensive power supplies in an essentially arc-damage free environment
  •  Achieve superior target utilization
  •  Apply virtually full rated output of power supply to source across broad pressure range
  •  Deposit very thin films at extremely low power levels

 

 


 

Arc Damage is Virtually Eliminated When Arc Detection & Suppression is Activated

Click here to download & play flash video of Ion 1500 and Polaris Source in Operation -
still images from this video shown below

 

 

 

Hard arc on Al target in O2 environment on
3" Polaris™ source - no arc suppression

 

 

 

 

 

 

 

Same view & conditions as above, but with
plasma re-igniting - arcing is still decaying

 

 

 

 

 

 

 

Arc suppression of Ion™ 1500 working in same
environment & conditions - producing a stable
plasma & good target utilization with negligible
arc induced damage.

 

 

 

 

Accessories

 

 

Blocking filters (required when the Ion™ 1500
is used simultaneously with an RF Power Supply) and
switches that allow the sequential use of multiple sputtering
sources from a single power supply are available.

 

 

 

 

 

    DC Pass/RF Blocking Filter Installed on Output of Ion™ 1500

 

 

Home Site Map

Copyright © 1993-2012 Materials Science, Inc.
Last modified: 10 January 2012