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Source Performance
SunSource GEN II
SunSource Round

 

 

GEN II 
Upgrades and Retrofit Sputtering Sources

 

    Retrofit for Inline Ulvac Sputtering Sytem

90x580mm_72dpi_SunSource Logo.jpg (116547 bytes)  

Upgrades system performance in measurable terms

Replaces obsolete source no longer supported by
     original manufacturer & provides superior performance

Increases reliability, Lowers cost of ownership

Includes the features & benefits of SunSource™ &
     SunSource GEN II™ Sputtering Sources

 

 

How Does Materials Science, Inc. Define a "Retrofit"?

SunSource™ sputtering sources provide measurable benefits like improved target utilization, argon gas injection through the cathode body, stable operation through out the useful target lifetime during pulsed reactive sputter deposition at 10-4 torr and much lower cost of ownership.  The features and benefits described for our standard line of SunSource™ and SunSource GEN II sources are incorporated into the retrofit/upgrade designs we provide.  Essentially, we take the basic sputtering module and configure it so that it fits within your existing system  Usually (not always) we can do so.

The ability to implement these features into a source that fits within the physical constraints of an existing system is how we define a retrofit sputtering source.  We are not interested in offering a source that performs and lasts just as poorly (but equally as well!) as the one it is replacing at a cheap price.  If you consume one target every 5 years, you will probably run from the room clutching at your throat about how expensive the source is, especially if your purchased your used system on e-Bay for $5.  Those interested in real productivity or trying to implement very difficult processes like an optical coating with less than 1% transmission adsorption will appreciate the performance of our upgrade retrofits and how reasonably they are priced for performance and reliability.  Good value for money provides a fast payback and low cost of ownership.

Maybe you just want to be able to "pour the coals" (aka shorten deposition time)  to a source to shorten run times without overheating the source, target material or damaging the substrate or the system the source is installed in.  Are you tired of constant leaks in the water lines, arcing and vastly different rates of target erosion top to bottom of a linear source or expensive repairs and spare parts?  We can help.

Materials Science, Inc originally began offering & advertising "retrofit" sputtering sources in early 1994.  Since then, this term has been adopted (co-opted?) by many of our competitors.  At the time, major manufacturers like MRC, Sloan, Perkin-Elmer & Vac-Tec Systems had either completely exited the marketplace as sputtering system suppliers or were about to and were simply not-available to support their customer base with new and upgraded sputtering sources that solved real problems.  Our main advantage at the time was greatly improved target utilization, but since then, we have continued to innovate and improve our SunSource™ sputtering sources.  The guy with a "cheater bar" in his pocket to give extra leverage to a wrench  to ensure all the fasteners are properly tightened and water lines don't leak is just as much in our mind as the scientist trying to figure out how many angels can dance on the head of a pin (has anyone finally figured this out?).  SunSource™ sputtering sources have to satisfy both of them.  Good design results from paying attention and being responsive.

Examples of Problems Solved and Productivity Gains

Leybold PK750 Retrofit.jpg (366310 bytes)Leybold PK 750 

SunSource™ retrofit:

bulletImproved target utilization by nearly 20 wt%
bulletVirtually eliminated re-deposition of backscattered
material in center of target
bulletBonded targets no longer have to be bonded to the
cathode body - a much less expensive flat target
backing plate is used instead
bulletDisassembly of cathode assembly is no longer
required when exchanging targets

 

 "Homegrown"

Homegrown_Water_Power.jpg (523323 bytes)Homegrown_Process Problems.jpg (586700 bytes)Homegrown_Too Thin Targets.jpg (487845 bytes)

SunSource GEN II™ Upgrade Replacement:

bulletFixed completely inadequate water flow through cathode body that overheated magnets and induced "wiggle" down length of source that created non-uniform films
bulletMuch higher power levels can be applied and rates are higher
bulletPower distribution is now symmetrical and uniform across target surface
bulletGas distribution is now uniform across target surface.  Solved argon gas depletion problem on target surface that caused significantly non-uniform distribution
bulletElectrons are not preferentially "robbed" from target surface toward ground planes, creating higher and lower areas of sputtering from target surface due to plasma disturbance, thus non-uniform films
bulletTargets thicker than 0.125" can now be sputtered.  Useful target life does not pre-dominate periodic maintenance requirement, as before.
bulletEffective target wt% target utilization is nominally 25% higher

 

Sloan Orbitorr™

13_Sloan_Orbitorr_Logo_72dpi.jpg (100043 bytes) Sloan_Orbitorr Upgrade-Shields Removed_logo_72dpi.jpg (106728 bytes) 11_Sloan_Orbitorr_Logo_72dpi.jpg (109088 bytes) 10_Sloan_Orbitorr_Logo_72dpi.jpg (124776 bytes)

SunSource™ upgrade:

bulletImproved target utilization by nearly 20 wt% for 3.5" x 8" targets
bulletLow pressure operation now possible - cleaner, denser films
bulletVirtually eliminated re-deposition of backscattered
material in center of target
bulletBonded targets no longer have to be bonded to the
cathode body - a much less expensive flat target
backing plate is used instead
bulletGas distribution is now uniform across target surface
bulletClamped & directly water-cooled targets now possible
bulletDisassembly of cathode assembly is no longer
required when exchanging targets
bulletSputters magnetic materials

 

Kurt Lesker Torus™ Series

Lesker1.jpg (98293 bytes)

Research & Development HV & UHV Sources:

bulletEliminated immediate galvanic corrosion of aluminum parts
exposed to cooling water
bulletMagnet module is no longer a "consumable" item

 

Torus-10™ Sources: Greatly improved distribution uniformity & higher rates by replacing with SunSource™
6" Round Sputtering Source. See customer supplied data.

MRC 600/900 Series Retrofit

This is a SunSource GEN II™ 5" x 15" source packaged to fit the MRC system, not just an exact copy of the old design offered by most of our competitors.  It features:

bullet35-40 wt% real target utilization
bulletGas injection through the cathode body
bulletKamlok™ fast target exchange system - no fasteners to seize & gall
bulletLow cost target backing plate for bonded targets instead of more expensive MRC cathode body
bulletHigher rates
bulletLower pressures

  Interface Control Drawing 00000686

Which "40%" target utilization source would you rather have?:

AS MRC Retrofit.jpg (16449 bytes)   MRC 600_900 Retrofit Eroded Targets.jpg (785386 bytes)

  Eroded target from leading competitors MRC Retrofit              Eroded targets from SunSource™ MRC Retrofit

 

 
We have also provided retrofit sources for old Perkin-Elmer, Sloan Orbitorr™, Vac-Tec Systems Fleximag™, Ulvac and others.  Contact us to discuss your needs and how we can help.

 

 

 

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Last modified: April 04, 2008