 | 35 wt% Target Utilization - 10mm /0.40" thick
targets
|
| Perfect for Sputtering Precious Metals
|
| Virtually No Center Redeposition
|
| Good Target Utilization Even at Very Low Power Levels
|
| Stable Operation Across a Broad Pressure Range
|
| Ideally suited for Small Vacuum Web Coaters -
Distribution
from Source More Easily Matched to Circumference of
Chilled Drum. Cantilevered Internal Mount Version
Available with Utilities Fed Through End of Source for
Mounting on Source Flange.
|
| Cost-Effective Alternative to Small Rotatable
Cylindrical
Magnetrons
|
| Same Construction Features, Performance & Benefits as
all other SunSource GEN II™ Sources
|
| Plasma Discharge is confined to region above target
surface due to highly balanced magnetic design. No
strong stray electromagnetic fields that
promote arcing,
substrate damage and heating from electron & ion
bombardment, and sputtering of the source itself. |
Custom Flange Mounted 90mm Source
SunSource GEN II™ sources
consist of a basic sputtering
module that can be integrated
into a variety of source mounting
schemes. External flange mount,
internal mount and retrofit
configurations are available with
a variety of feedthrough and
utility connection possibilities.
Internal Mount 90mm Source
with top and side anode shields installed.
GEN II 90mm & 3.5 Inch Wide Linear Magnetron Sputtering Sources
