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                        High Target Utilization - High Performance Magnetron Sputtering Sources

                We Provide Engineered Solutions - Exactly the Right Source for Your Process and System Needs Since 1992

 

High Utilization
Narrow Width Sources

  IonDC Magnetron Sputtering Sources
with Advanced Arc Suppression

       

 

Performance Characteristics

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Linear/Rectangular Sources

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  Polaris™ 2" & 3" Research Sources
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Last modified: June 24, 2010