High Target Utilization - High Performance Magnetron Sputtering Sources We Provide Engineered Solutions - Exactly the Right Source for Your Process and System Needs Since 1992 High Utilization Narrow Width Sources 
| Ion™ DC Magnetron Sputtering Sources with Advanced Arc Suppression
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Performance Characteristics 
| Round Sources 
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Kamlok™ Fast Target Exchange System 
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Linear/Rectangular Sources 
| Polaris™ 2" & 3" Research Sources  |
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