These modules provide an easy way to remotely switch the output of one or two power systems between two or more sputtering sources.  This provides a cost-effective approach in many R&D environments.  They can replace the need for multiple separate power supplies at considerable cost savings.

In the case of multiple sputtering sources using RF power, it is best that an individual impedance matching network be provided for each source, with the power switch located between the RF power generator and the impedance matching network. This ensures the individual load represented by each sputtering source can be optimized for different target materials and varied states of erosion.  If the switch is located after the output of a single impedance matching network, it is likely that the network will have to be adjusted to compensate for significantly different loads (ie - metal target on one source and a dielectric target on the second source).

High quality vacuum relays are used in the switches instead of open frame relays.  Vacuum relays are preferred because they are more robust and provide reliable long-term operation.

Control

The user must provide the necessary 24 VDC (< 1 amp) signals needed to operate the relays from a PLC or computer control system.  An optional 1/2 rack remote controller is available.  The controller comes with a 10' control cable.

Turn off the power supply before changing the power output selection.  These switching modules are not interlocked and therefore the user will need to ensure that the relays are not "hot-switched" as extreme damage to the relays will occur. 

This type of damage is not covered under warranty.

We suggest that you use a maximum RG-393 cable length of 36" [915mm] when using RF power supplies.  This length will limit the amount of lost RF power (as heat) and maximize the power transfer to the sputtering source.

DC magnetron power supplies should use cable lengths of 8-10' [2.5 - 3 meters].

RF Power: RG-393 should be used in applications up to 600 watts.  Do not used RG-400 unless the power level is below 100 watts.

DC Power: RG-8/U should be used.

Each user will require a somewhat different RF matching configuration based upon cable lengths, target materials and overall process conditions.  A typical single sputtering source/impedance matching network combination is optimized to match just the connected source.  If the user changes target materials (i.e. sputtering a metal and then changing to a dielectric), then the matching network may require adjustment of the series inductor (changing the tap setting) or in some cases the addition of fixed shunt capacitance.  Always refer to the matching network instruction manual for specific information relating to setting up the match.