High Target Utilization - High Performance Magnetron Sputtering Sources,
Power Supplies and Accessories We Provide Engineered Solutions - Exactly the Right Source for Your Process and System Needs Since 1992 High Utilization
Narrow Width Sources 
| Ion™ DC Magnetron Sputtering Power Supplies
with Advanced Arc Suppression
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Performance Characteristics 
| Round Sources 
|
Kamlok™ Fast Target
Exchange System 
| RF Power Supplies and
Sputtering Packages 
|
Linear/Rectangular Sources 
| Polaris™ 2" & 3" Research Sources
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| 
