Monte Carlo Film Thickness Distribution Modeling Software

SunSource™ Modeler Distribution Modeling Software for Round Cathodes

Download this file to the desired directory on your computer, upzip "setup.exe" and follow the instructions in the installation program.  Become familiar with  the "readme" file before using.

This is a widely distributed, very accurate modeling program developed by Materials Science, Inc. used to establish the effects of very basic process geometries such as source-to-substrate distance, pressure, source-to-substrate angular relationship, source-to-substrate offset position and the like for various materials and pressures.  It is used to determine the required number of sputtering sources, the correct size and necessary process geometry's when designing new systems or modifying existing ones.

If you are trying to figure out what magnetron sputtering source to select, this program will help point you in the right direction.  Please understand that a predictive modeling program is just that and does not imply a  guaranteed result.  Too many other factors can significantly impact the results obtained - pressure uniformity within the process chamber, background pressure, how close the sputtering source is to the chamber wall or other ground planes that may "rob" needed electrons, pumping scheme, etc.  Different target materials produce sometimes significantly different results in an otherwise identical environment.

A MAJOR caveat is that the program (and all similar predictive programs) assumes an erosion profile ("aka" the emission source) that is defined by the specific magnetic design used to confine the plasma on the target surface.  This means, in plain English, that it only works for our products.  In commercial terms, these designs are commonly referred to as "high target utilization (broad plasma spread across the target surface), "unbalanced" which is meant to infer relatively high levels of ion bombardment on the substrate compared to highly balanced ("high target utilization") designs, but at the very significant cost of target utiliization (perhaps 10% of the available target inventory is used compared to about 40%).

It's very important to be able to discriminate between the various magnetic designs and understand the practical implications of the potential choices.  High target utililization must be balanced against the need for and the  undesirability of high levels of substrate ion bombardment, depending upon the process and devices being manufactured.  

The moral of this story: You need to be prepared to be proactively in charge of your process and and making it succeed.  The hardware purchased is not the issue - how the process environment was originally conceived and implemented is.  The SunSource Modeler™  is just a tool to help you define this process environment.

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Last modified: April 04, 2008